EUV Lithography Market Size, Share, Opportunities, And Trends By End-User (Integrated Device Manufacturer, Foundry) And By Geography - Forecasts From 2025 To 2030

Description

The EUV Lithography Market will climb from USD 13.866 billion in 2025 to USD 28.873 billion by 2030, with a 15.80% CAGR.

EUV lithography is the advanced lithography technology that makes use of small wavelengths so as to create circuits to obtain higher resolution outputs. As per Moore’s law, the transistor density doubles every 24 months with the semiconductor manufacturers focusing on continuously shrinking the size of integrated circuit components. The chip manufacturers have already reduced the feature sizes to as small as 42 nm using 193-nm lithographic systems, however, it was accommodated with complex manufacturing techniques and the rising cost of chips. The ability of the EUV lithography to further allow shrinkage at a relatively reduced cost has led to its gaining popularity. Simultaneously, rising expenditure on research and development activities so as to develop advanced circuits using EUV lithography technology will drive the demand for this market. However, the high cost of these devices will hinder the growing demand for these systems over the forecast period.

Segmentation

• By Components
  • EUV Scanner Tool
  • Light Source
  • Mirror/Optical System
  • Photomasks
  • Photoresists
  • Metrology and Inspection Systems
  • Others
• By End-User
  • Integrated Device Manufacturers (IDMs)
  • Foundries
  • Others (Research, equipment vendors, and others)
• By Geography
  • North America
    • USA
    • Canada
    • Mexico
  • South America
    • Brazil
    • Argentina
    • Others
  • Europe
    • United Kingdom
    • Germany
    • France
    • Spain
    • Others
  • Middle East and Africa
    • Saudi Arabia
    • UAE
    • Others
  • Asia Pacific
    • China
    • Japan
    • India
    • South Korea
    • Taiwan
    • Others

Table Of Contents

1. EXECUTIVE SUMMARY  

2. MARKET SNAPSHOT  

2.1. Market Overview  

2.2. Market Definition  

2.3. Scope of the Study  

2.4. Market Segmentation  

3. BUSINESS LANDSCAPE  

3.1. Market Drivers  

3.2. Market Restraints  

3.3. Market Opportunities  

3.4. Porter’s Five Forces Analysis  

3.5. Industry Value Chain Analysis  

3.6. Policies and Regulations  

3.7. Strategic Recommendations  

4. TECHNOLOGICAL OUTLOOK  

5. EUV LITHOGRAPHY MARKET BY COMPONENTS  

5.1. Introduction  

5.2. EUV Scanner Tool  

5.3. Light Source  

5.4. Mirror/Optical System  

5.5. Photomasks  

5.6. Photoresists  

5.7. Metrology and Inspection Systems  

5.8. Others  

6. EUV LITHOGRAPHY MARKET BY END-USER  

6.1. Introduction  

6.2. Integrated Device Manufacturers (IDMs)  

6.3. Foundries  

6.4. Others (Research, equipment vendors, and others)  

7. EUV LITHOGRAPHY MARKET BY GEOGRAPHY

7.1. Introduction

7.2. North America

7.2.1. USA

7.2.2. Canada

7.2.3. Mexico

7.3. South America

7.3.1. Brazil

7.3.2. Argentina

7.3.3. Others

7.4. Europe

7.4.1. United Kingdom

7.4.2. Germany

7.4.3. France

7.4.4. Spain

7.4.5. Others

7.5. Middle East and Africa

7.5.1. Saudi Arabia

7.5.2. UAE

7.5.3. Others

7.6. Asia Pacific

7.6.1. China

7.6.2. Japan

7.6.3. India

7.6.4. South Korea

7.6.5. Taiwan

7.6.6. Others

8. COMPETITIVE ENVIRONMENT AND ANALYSIS  

8.1. Major Players and Strategy Analysis  

8.2. Market Share Analysis  

8.3. Mergers, Acquisitions, Agreements, and Collaborations  

8.4. Competitive Dashboard  

9. COMPANY PROFILES  

9.1. ASML  

9.2. Cymer (ASML Subsidiary)  

9.3. Zeiss International  

9.4. Toppan Printing Co., Ltd.  

9.5. NTT Advanced Technology Corporation  

9.6. JSR Corporation  

9.7. Gigaphoton Inc.  

9.8. Shin-Etsu  

9.9. KLA Corporation  

10. RESEARCH METHODOLOGY  

LIST OF FIGURES  

LIST OF TABLES  

Companies Profiled

ASML  

Cymer (ASML Subsidiary)  

Zeiss International  

Toppan Printing Co., Ltd.  

NTT Advanced Technology Corporation  

JSR Corporation  

Gigaphoton Inc.  

Shin-Etsu  

KLA Corporation  

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