The Semiconductor Etch Equipment Market is expected to grow from USD 28.578 billion in 2025 to USD 37.024 billion in 2030, at a CAGR of 5.32%.
Etching is a critical operation in the semiconductor production cycle. This method removes material from the surface of the semiconductor to form patterns depending on its applications. The expansion of the semiconductor wafer deposition and wafer processing industries is critical to the semiconductor etch equipment market growth. An increased emphasis on consumer electronics is one of the key factors driving market expansion. Furthermore, industrial automation, continual developments in consumer electronics, and the use of vehicle sensors are expanding the applications of semiconductors. Their popularity in practically all industrial verticals contributes to the market's expansion.
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In recent years, IoT and 5G gadgets have become quicker, smaller, and more multifunctional. This has given rise to advanced packaging technology-based production, in which a middle-end process has been inserted between the front-end and back-end processes in semiconductor manufacturing. As a result, in October 2019, IBM Japan, Ltd. and Panasonic Corporation's subsidiary, Panasonic Smart Factory Solutions Co., Ltd., announced a collaboration to develop and market a new high-value-added system to optimize the overall equipment effectiveness (OEE) of customers' semiconductor manufacturing processes and achieve high-quality manufacturing. Panasonic is currently developing and marketing cutting-edge equipment and manufacturing methods that aid in the advancement of semiconductor production for advanced packaging. New gadgets and procedures include dry etching equipment, plasma dicers to manufacture high-quality wafers, plasma cleaners to boost metal and resin adherence, and high-accuracy bonding devices. This experience will be integrated with techniques and technology created by IBM Japan for semiconductor production to assist Panasonic in developing smart factory technology.
Plasma etching is a vital procedure used in semiconductor manufacture to remove materials from unit surfaces, and it is the only economically feasible method for anisotropic surface removal. As the semiconductor industry strives to lower crucial feature sizes and increase device performance, etch processing problems are increasing as smaller features are treated with novel device designs. Higher density and aspect ratio features present new issues requiring extra innovation in various wafer processing areas. Because of their complexity, these developments rely increasingly on detailed physical, chemical, and computational models of plasma etch processes. For instance, Lam Research Corporation announced the launch of a completely transformed plasma etch technology and system solution in March 2020. According to the company, this technology is intended to give chipmakers with advanced functionality and extendibility needed for future innovation. As per the same source, Lam's Sense.i platform provides unrivalled system intelligence in a compact, high-density architecture to enable process performance at the highest productivity, enabling logic and memory device roadmaps for the next decade.
Conductor etching equipment is commonly used to form the electrically active materials found in various portions of a semiconductor device. Even little variations in these microscopic semiconductor structures can result in an electrical fault that degrades device performance. During the forecasted period, the increasing demand for downsizing semiconductor circuits is expected to stimulate the ever-increasing demand for various types of conductors etching equipment and the necessity for high production of multi-film stacks with tiny faults. For example, Applied Materials, Inc. announced in August 2020 a new addition to its very successful Centris Sym3 etch product line, allowing chipmakers to accurately pattern and shape ever-smaller features in cutting-edge memory and logic devices. It employs cutting-edge RF pulsing technology to enable clients to produce densely packed, high-aspect-ratio structures in 3D NAND, DRAM, and logic, including FinFETs and upcoming gate-all-around architectures, by providing exceptionally high materials selectivity, depth control, and profile control.
The Asia-Pacific region accounts for the lion's share of worldwide semiconductor foundries. According to a survey by the Semiconductor Sector Association in July 2021, China has mastered various chip technologies, and its commercial semiconductor industry is still very young. Nonetheless, the Chinese government is attempting to bridge the gap by investing an estimated $28.9 billion in October 2019. It is positioned to become more competitive in the semiconductor etch equipment industry due to rising markets. For instance, Advanced Micro-Fabrication Equipment Inc., China (AMEC), celebrated a milestone for its capacitively coupled plasma (CCP) etch systems in November 2021 by shipping its 1500th station to a top Chinese semiconductor manufacturer. AMEC's etcher innovation continues to reinforce the company's position as an equipment leader, boost market share, and fuel growth.
India has also always had a lot of research and development skills and resources. Many of the world's biggest semiconductor and WFE producers and considerable R&D capabilities are based in India. The availability of a technically skilled workforce greatly assists in product design and testing. For instance, Lam Research declared in September 2022 the inauguration of its second research and development (R&D) centre in India. The new centre will feature a "state-of-the-art" hardware engineering lab with deposition, etching, and wet processing devices, as well as AR/VR capabilities.
| Report Metric | Details |
|---|---|
| Study Period | 2021 to 2031 |
| Historical Data | 2021 to 2024 |
| Base Year | 2025 |
| Forecast Period | 2026 β 2031 |
| Report Metric | Details |
| Semiconductor Etch Equipment Market Size in 2025 | USD 28.578 billion |
| Semiconductor Etch Equipment Market Size in 2030 | USD 37.024 billion |
| Growth Rate | CAGR of 5.32% |
| Study Period | 2020 to 2030 |
| Historical Data | 2020 to 2023 |
| Base Year | 2024 |
| Forecast Period | 2025 – 2030 |
| Forecast Unit (Value) | USD Billion |
| Segmentation |
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| Geographical Segmentation | North America, South America, Europe, Middle East and Africa, Asia Pacific |
| List of Major Companies in Semiconductor Etch Equipment Market |
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| Customization Scope | Free report customization with purchase |